Hi
I´m using black wax as wet etching protector. In bibliografy it is
dissolved in toluene and cured at 100 ºC in oven for 1 hs, then after
being deposited on the wafer. The problem is that this protective film
only takes about an hours in KOH 40% at 60ºC.
Someone has experience what are the optimal conditions for working with
this material?
Thanks
Anahí

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Lic. Anahi F. Weinstock

INSTITUTO NACIONAL DE TECNOLOGÍA INDUSTRIAL
CENTRO DE INVESTIGACIÓN Y DESARROLLO EN
TELECOMUNICACIONES, ELECTRÓNICA E INFORMÁTICA

Teléfono (54 11) 4724 6200/6300/6400
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wanahi@inti.gov.ar
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