Thanks. Actually I have already tried the method used in the APL paper
(scratch the surface, sonication,etc). But it just doesn't work. Maybe I
will try to use NanoStrip to remove PMMA layer.

Best regards,

Jun

On Fri, Aug 29, 2008 at 1:01 PM, Roger Shile  wrote:

> Atomic Layer Deposition is conformal deposition process. I would,
> therefore, have expected some difficulty doing liftoff.
> However Google search for "ald liftoff" returned the following which you
> might find helpful,
>
> Low-temperature atomic-layer-deposition lift-off method for
> microelectronic
> and nanoelectronic applications
> APPLIED PHYSICS LETTERS VOLUME 83, NUMBER 12 22 SEPTEMBER 2003, p.2405
>
> Roger Shile