A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: PMMA-950K-A6 resist peeling problem after Ni-Au deposition
PMMA-950K-A6 resist peeling problem after Ni-Au deposition
2009-01-20
basar bolukbas
2009-01-22
Kagan Topalli
2009-01-23
basar bolukbas
2009-01-21
Ananth Krishnan
2009-01-23
basar bolukbas
2009-01-25
Ananth Krishnan
2009-01-25
basar bolukbas
PMMA-950K-A6 resist peeling problem after Ni-Au deposition
basar bolukbas
2009-01-23
Hi Dear Ananth

a) My prebake receipe is : 180C-60s. in hot plate.
b) For lower thickness, yes you are right, i observed less peeling problem.
c) I dont think that if there is a organic residue layer on my sample, but i
will try your receipe.
d) My substrate is SiC-HEMT.

Thank you very much for helping.

Best Regards.
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
The Branford Group
Process Variations in Microsystems Manufacturing
Tanner EDA by Mentor Graphics
Harrick Plasma, Inc.