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MEMSnet Home: MEMS-Talk: PMMA-950K-A6 resist peeling problem after Ni-Au deposition
PMMA-950K-A6 resist peeling problem after Ni-Au deposition
2009-01-20
basar bolukbas
2009-01-22
Kagan Topalli
2009-01-23
basar bolukbas
2009-01-21
Ananth Krishnan
2009-01-23
basar bolukbas
2009-01-25
Ananth Krishnan
2009-01-25
basar bolukbas
PMMA-950K-A6 resist peeling problem after Ni-Au deposition
basar bolukbas
2009-01-25
Dear Ananth,

I appreciate your help.

1. Yes we have oven, and i will try your suggestions as soon as possible.
2. Is this post bake condition damage to futures? (future size is 300nm.)
3. I make deposition step by step like your suggestion.
Exm: 500A deposition - 5min cooling time (rate:3A/sec.)

I think these conditions are not enough for cooling of samples?

Best regards.
reply
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