Does anyone have experience depositing amorphous GaP films by sputtering or
evap? I am using a crystalline GaP wafer as the sputtering target in an RF
magnetron system, but the films have too much phosphorous (EDAX analysis).
 My theory is that GaP is decomposing during deposition, and since Ga has a
higher vapor pressure than P it is producing a P-rich film. I tried
depositing at an extremely low rate to reduce decomposition, but the results
were the same. I would appreciate anyone with experience in this.