Yes you need to Silylate the first resist.  The Silicon barrier you set
up will stop the second resist solvent dissolving the first resist.

Bill Moffat

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of basar bolukbas
Sent: Thursday, January 29, 2009 10:36 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Double lithography problem with SU1828-TI35ES

Hello everyone,

I am making lithography with SU1828. After patterning of this resist, i
need to make a another lithography on top of SU1828's patterns, but when
i spin to other resist (TI35ES) the solvent of TI35ES dissolves to
patterns of SU1828.

Do you have similar experience?