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MEMSnet Home: MEMS-Talk: Ti layer measurement...
Ti layer measurement...
2009-02-09
Javier Crespo
2009-02-09
Jie Zou
2009-02-09
Evelyn B
2009-02-13
Albert Henning
2009-02-13
Brian Stahl
2009-02-13
Rick Williston
2009-02-17
Albert Henning
2009-02-18
Fei Wang
2009-02-18
Wilson, Thomas
2009-02-18
Kirt Williams
2009-02-18
Mehmet Aykol
Ti layer measurement...
Brian Stahl
2009-02-13
Al has a good point - stylus profilometers are perfectly capable of
measuring step heights around 100nm.  Before you sputter, mask a small
sacrificial area of your wafer with a tiny piece of Kapton tape, sputter,
peel the tape off afterwards and measure the step height.  Just make sure
your tape is vacuum-compatible to avoid contaminating your chamber/film.

Brian C. Stahl
Graduate Student Researcher
UCSB Materials Research Laboratory
brian.stahl@gmail.com / bstahl@mrl.ucsb.edu
Cell: (805) 748-5839
Office: MRL 3117A


On Fri, Feb 13, 2009 at 9:13 AM, Albert Henning wrote:

> Neither ellipsometry nor reflectometry will be able to measure
> thicknesses of metal films in excess of about 50 nm.  Thicknesses beyond
> 50 nm cannot be distinguished optically from a bulk metal.  OTOH, even
> an ancient AlphaStep can work just fine.
>
> Al
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