Hi all,

   I am new to lithography technique. I am facing few practical problems.
I will be grateful if some one helps me in this regard.

   1. I face problem of bubbles on the photoresist. If i remove bubbles
with difficulty, still i find discontinuity in resist film of microns after
spin coating.
   2. how to store photoresist? in refrigerator?
   3. Which is the best solvent for photoresist (to wash away after etching)?
  Is it universal one? I used acetone.
  The photoresist i am using is a positive one HPR204.

with regards
Radhakrishna.V
                  _________________________________________

                               Radhakrishna.V
                               Research Student

                  Dept. of Instrumentation   |   Room No: R47
                  IISc, Bangalore-560 012    |   IISc Hostel
                  Ph: 309 2349               |   Ph: 309 2539
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