Hi

Does anyone know of a PMMA photoresist which can be exposed with i-line (or
any wavelength >360nm) which can be used for thick layers (>50microns)?
Alternatively, I may be able to get access to EBL, in which case I am
thinking of using Microchem's Nano PMMA resist. Does anyone know if it would
be feasible to do thick layers with this?

Best regards

Gareth