>Hi
>
>I need to deposit SiO2 layers about 10 microns thick for a >microwave
>device. At the moment, am using spin-on glass (solvent based) as >an
easy
>way of getting done. However, I am not able to achieve good films
>beyond
>4 microns.
>
>Could anybody suggest a better speedier method to deposit SiO2 >or a
>better spin-on glass material.
>
>Try PECVD oxide deposition. You can get film thicknesses over 10 >µm...

--