Thanks for the response.  What kind of sample preparation is required for
the HR SEM method?  Can you recommend any papers on this subject?

Thanks,


On Wed, Nov 4, 2009 at 3:56 PM, Pramod Gupta  wrote:

>   TEM is the best. The high resolution SEM will also work.
>
>
> --- On *Wed, 11/4/09, Evelyn B * wrote:
>
>
> From: Evelyn B 
> Subject: [mems-talk] Crystal Size Calculation
> To: "General MEMS discussion" , "Evelyn Benabe" <
> benabe@mail.usf.edu>
> Date: Wednesday, November 4, 2009, 12:01 PM
>
>   Hi all,
>
> I will be depositing BST60/40 films on MgO and Alumina substrates and
> investigate the effects of annealing on crystal size.  As a result, I am
> trying to determine the best way of calculating the crystal size.  My
> original plan was to use XRD to calculate crystal size using Scherrer's
> formula but I was told that this is not very accurate because both strain
> and crystal size get affected by annealing and may both affect the peak
> width making it hard to distinguish which effects are due to strain and
> which are due to crystal size change.  I have also heard that TEM is
> supposed to be more accurate than XRD for this calculation because the
> actual crystal size can be measured instead of estimated from XRD.
>
> Can any one comment on this or provide a good reference for me to use?  I
> am
> trying to see if I should really use the TEM technique as sample
> preparation
> is a very time consuming process.  Thanks to all,
>
> --
> EVELYN BENABE

--
EVELYN BENABE
Graduate Research Assistant
RF Microsystems Research Group
University of South Florida
4202 East Fowler Avenue
Tampa, FL 33620
Office: ENB 412
Office Phone: (813)-974-4851