Hello,

We have done both, evaporation and sputtering. Evaporated film show a bad
surface structure, due to thermal effects the layer cracks. With sputtering it
is easier to get a dense film.


Best regards
Gudrun



-----Ursprüngliche Nachricht-----
Von: [email protected] [mailto:[email protected]] Im
Auftrag von Jauniskis, Linas
Gesendet: Montag, 16. November 2009 14:59
An: [email protected]
Betreff: [mems-talk] Tungsten deposition, e-beam, sputter

Hi,

While I see e-beam as a recommended technique for depositing tungsten thin film,
I have not been able to find a reference for what type of crucible to use. Could
someone suggest crucible type? Any other particulars about e-beam of tungsten
one should be aware of?

Am also considering sputtering. Is tungsten particularly difficult to sputter,
as compared to say titanium?

Thank you,
Linas.