Hi Sebastian,

why did you use AZ400K developer with 1:2 dilution? Normally it is used at 1:3
or 1:4 proportion. another way i would suggest is to agitate the developer.
Megasonic bath would be a good one, if you are cautious about your patterns.

Yingtao

-----Original Message-----
From: [email protected] [mailto:[email protected]] On
Behalf Of Sebastian Sosin - EWI
Sent: 07 December 2009 16:01
To: [email protected]
Subject: [mems-talk] AZ9260 residue after development

I have a process to create tall (40-50 microns) pillar of AZ9260. After
development (AZ400k, 1:2 dilution), I notice a residual film present on
the wafer. The film is not present in areas where EBR was done (with
acetone).

The film can be removed by using a fine brush in the developer bath.
This method is not desired and the surface is not clean even if the
visible part of the film is gone.

Can someone suggest a treatment to remove this film and not damage the
copper pattern I have on my wafer?


Regards,
Sebastian Soisn