Hi all,

does anyone know if Moiré patternes have been used for alignment of
mask patterns to (111) planes on (110) wafers ?

On (110) wafers I would realize a pre-etch in order to define the (111)
planes, then i would use Moirè patterns for a fine alignment of the mask
features to the (111) planes.

I presume that someone has already done this job but i can not find any
paper. Is there any suggestion ?

Best regards,
Andrea