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MEMSnet Home: MEMS-Talk: cleaning problem
cleaning problem
2010-09-07
Andrea Mazzolari
2010-09-07
Marcel Spurny
2010-09-07
Andrea Mazzolari
2010-09-07
Bill Moffat
2010-09-07
David Casale
2010-09-07
Andrea Mazzolari
2010-09-08
Paul Nguyen
cleaning problem
Marcel Spurny
2010-09-07
Hi,
How long do you etch with BHF? And what is your baking recipe for S1813?
It could be that you are etching for too long and the resist is attacked
too much by BHF.

Cheers,
Marcel


Am 07/09/2010 15:58, schrieb Andrea Mazzolari:
> Hi all,
>
> here i have (110) silicon wafers coated with silicon nitride.
> I patterned the silicon nitride and etched the wafers in KOH and obtained
> silicon pieces of lateral size 20x70mm.
>
> I need to pattern the silicon nitride on such silicon pieces.
> I cleaned the silicon pieces with acetone/IPA then RCA1 and RCA2 to remove
> any residue. I coated the silicon pieces with S1813 photoresist and tried
> to pattern the silicon nitride with BHF. After sometime the PR is removed
> from the silicon pieces.
>
> I suppose the starting silicon pieces were not correctly cleaned. Any
> suggestion on how to improve the cleaning ?
>
> Best regards,
> Andrea

Marcel Spurny, Dipl. Phys. MPhys.
School of Physics&  Astronomy
University of St. Andrews
North Haugh
St. Andrews
KY16 9SS
Fife
Scotland, United Kingdom
Tel.: 01334 467336

The University of St Andrews is a charity registered in Scotland : No SC013532

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