You might try 600 Angstroms of chrome followed by 3000 Angstroms of
sputtered gold.  Cover this with 2000 Angstroms of PECVD Si3N4, which could
be used as a mask to etch the underlying metals and provide an additional
barrier to the etching.



-----Original Message-----
From: Julian Shapley 
To: MEMS@ISI.EDU 
Date: Friday, November 06, 1998 11:37 PM
Subject: HF resist


>Hello Mems Workers
>
>Could anybody give me any leads on a substance that could be used as a
>masking material for HF for a long period of time.
>
>Thanks in advance
>
>Julian Shapley
>University of Cardiff.
>UK
>
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