Gert,

I have heard reports that AZ5200 series resists can be unreliable from batch to
batch, and that formation of the negative slope profile is very dependent on
image reversal bake parameters. (i.e. Hotplate must be accurate within 1 degree
C, surface of hotplate and bottom of wafer must be very clean) What has your
experience been with these resists?

I have also heard of a positive resist called BPRS100 made by O.C.G. that forms
a layer of lower solubility at the top surface so that a negative tapered
profile is obtained with overdevelopment. Does anyone in the MEMS group have
any experience with this product?

Brian Cunningham
Draper Laboratory
[email protected]