I am having problems cleaning this Hard mask, That is to remove the extra
PDMS that is stuck to the hard mask. We tried O2 plasma, IPA with and
without ultrasonicating. Nothing is helping that poor PDMS to detach from
the silicon hard mask. How do you guys do it?

Another problem is making the PDMS mold for the NIL process. When made there
is a formation of clarity diorder it looked like a fogged glass. what do you
guys think this is? help needed.

Thanks for replying,

sung mung,
International Scholar,
IMEC
Belgium.