Hi,

search for "stoney equation" on google, it will provide many useful results.

Best regards,
Andrea

-----Messaggio originale-----
Da: mems-talk-bounces+mazzolari=fe.infn.it@memsnet.org
[mailto:mems-talk-bounces+mazzolari=fe.infn.it@memsnet.org] Per conto di
zhijian
Inviato: Tuesday, June 14, 2011 5:44 PM
A: mems-talk@memsnet.org
Oggetto: [mems-talk] residual stress vs. thin film thickness

Dear Everyone,

I am confused with this question for a long time. Does the residual stress
have a relationship with the deposited film thickness?

I have heard that they are independent.

When I measured the residual stress of the low-stress LPCVD SiN, I found
that with the deposited SiN become thicker, the residual tensile stress is
also larger.

Has anybody had this experience?

Sincerely,
Zhijian ZHOU
Ph.D @ HKUST