Ion milling with argon will work for only 0.1 um of Ti.

   --Kirt Williams

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf
Of Shane GUO
Sent: Tuesday, July 12, 2011 8:57 AM
To: [email protected]
Subject: [mems-talk] Ti etching and S1813 resist

Hi all,

I would like to use S1813 resist as an etching mask for Ti. I am wondering
if there is anything that does not contain HF can work for me? I am thinking
about oxalic acid or H2O2. Do they attack S1813 resist? Can they work for a
100nm Ti layer? Any suggestion is welcome.


Best regards