Sorry guys, I should clarify this. My situation is that I can only use wet
etching. We do not have DRIE equipment. Our O2 plasma may not be powerful enough
for dry etching. It is only used for cleaning wafers.

Cheers

>________________________________
>From: Shane GUO 
>To: "[email protected]" 
>Sent: Tuesday, July 12, 2011 11:57:08 AM
>Subject: Regarding Ti etching and S1813 resist
>
>
>Hi all,
>
>
>I would like to use S1813 resist as an etching mask for Ti. I am wondering if
there is anything that does not contain HF can work for me? I am thinking about
oxalic acid or H2O2. Do they attack S1813 resist? Can they work for a 100nm Ti
layer? Any suggestion is welcome.
>
>Best regards
>