Use omnicoat from microchem as a release layer.

- Kevin

On Wed, Aug 10, 2011 at 11:41 AM, sumit kalsi  wrote:
> Hi,
>
> I am trying to use positive resist as a sacrificial layer for releasing the
> entire SU8 sheet (22mmx22mm) from my glass substrate. After postbaking the
> combination, I observed bubbles in the resist layer. I used AZ400k to dissolve
> the positive resist after developing SU8 but it did not come off. Anyone have
> any experience in this?
>
> Thanks a lot.
>
> Regards,
>
> Sumit