use piranha cleaning if your sample don't have metal layer, or O2 RIE
cleaning.


On Mon, 07 Nov 2011 22:49:48 +0800, Judith Linacero Blanco
 wrote:

> Hello everyone,
>
> I made a lithography by e-beam with lines of 200nm separated 200nm with
> 300nm of PMMA on silicon.
>
> Once I etch the silicon with RIE, and then I try to clean the
> sampleacetone,
> sonicated. The problem is that I still have traces of PMMA in the sample,
> and I can't clean at all the sample.
>
> Can anyone help? How I can clean the whole sample of e-beam lithography?

--
Sincerely
Jack, Zetao MA
Dept.of EEE, CYC712,HKU