If it is available and doesn't ruin your experiment you can use piranha, a
mixture of hydrogen peroxide and sulfuric acid, it's commercially available as
nanostrip.


Sent from my iPod

On Nov 19, 2011, at 9:25 AM, Naa-Dei Nikoi  wrote:

> Hello,
>
> I do apologise for asking what must be a very basic question. I'm using
> S1815 photoresist to create micropatterns for cell culture on borosilicate
> glass. I'm pretty happy with the process save for ensuring a good strip.
> Part of the patterning process sees me hardbake exposed and developed
> coverslips at 120 deg C for 10 minutes before applying a silanization
> solution to the exposed glass (1% dichlorodimethylsilane in heptane)  and
> curing that at 120 deg C for a further ten minutes -- even so, positive
> photoresist shouldn't be that challenging to remove.  When stripping, I
> typically wash with acetone followed immediately by isopropanol and then
> soak the glass in warmed 1165 ( I warm to 80 deg C then pour over  for ten
> minutes before rinsing in isopropanol and water.  I can still see 'shadows'
> of the patterns when looking under a light microscope, which I find rather
> disturbing.   Unfortunately, I don't have access to an asher or oxygen
> plasma -- I'm working in what is very much a 'general' lab.  I've tried an
> alternative method of soaking in two changes of DMSO (five minutes each
> time) and the results haven't been any better.
>
> Any advice I can get on improving my process I would dearly love.
>
>
> Thanks,
>
> Naa-Dei