Hey all,


this may sound a bit weird, but I have my reasons: I need to wet-etch
(phosphoric acid as enchant) an aluminum wafer. I must use an
inorganic mask for the purpose, but my favorite would be chromium:
deposit a thin layer of chromium on my aluminum wafer, pattern it with
ceric ammonium nitrate and then etch the aluminum with phosphoric
acid. I need to etch some 100 um of aluminum.

The big problem I have is, I don't know whether there will be some
electrochemical effects that would prevent either of the etching
processes. Let me know before I go and waste several hours in a futile
attempt.


By the way, happy and fruitful New Year - good health and successful
experiments going forward!


m