Unless you've got a really good reason to want an SU-8 channel, just
give up on the approach. Both glass-bonded microchannels and PDMS
microchannels are standardized protocols and are widely available in
the literature, to the point where you can order them both from
foundries. Go that route if you can.

- Kevin


On Wed, Jan 4, 2012 at 1:40 PM, Shiv GD  wrote:
> Hello Everyone,
>
> I am working on a Microchannel device, and facing some problem with AZ 4620
> and SU-8 Layer. The device is fabricated on a glass substrate and I am
> using AZ 4620 as sacrificial layer ( I need ~20um height). I patterned the
> AZ layer using standard lithography process ( Spincoat, Bake on Hotplate
> for 2mins @ 110'C, Expose and Develop using AZ 400K. ) and I want to keep
> it until the last step. I than, spincoat SU-8 2025 (on top of the AZ 4620
> layer), bake, expose, post bake. But when I try to develop the SU-8
> structure ( using Microchem SU-8 developer ), I observe that the SU-8
> structure develops alright but the AZ sacrificial layer is gone. As a
> result the SU-8 structure collapse, cracks and I can't continue to the next
> step.
>
> What do you think I can do to resolve the situation ? Please suggest.
>
> Your help is much appreciated.
>
> Thank you.
>
> Shib