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MEMSnet Home: MEMS-Talk: SU-8 process development
SU-8 process development
2012-01-10
Yingtao Tian
2012-01-10
Gary Hillman
2012-01-11
Shay
2012-01-11
Kevin Nichols
2012-01-12
Yingtao Tian
2012-01-11
Yingtao Tian
2012-01-11
Gareth Jenkins
2012-01-12
Yingtao Tian
2012-01-11
Andrew Sarangan
2012-01-12
Yingtao Tian
2012-01-16
Andrew Sarangan
SU-8 process development
Gareth Jenkins
2012-01-11
Hi

Do you get any structures left on the wafer? If they are falling off during
development, the exposure dose may be too low (as I believe Gary is saying).
Or do you get some structure on the wafer but with poor resolution? (In
which case Shay's idea may work).

The data sheet exposure dose values should just be a starting point. Many
things may alter results depending on your exact set-up.


On 11 January 2012 19:00, Yingtao Tian  wrote:

> Hi Gary,
>
> What did you mean 'expose the material properly'?
>
> Sorry to mention that the exposure dose is calculated by multiplying the
> time and intensity of 10 mJ/cm2. So, my exposure dose ranged from 70 mJ/cm2
> to 100 mJ/cm2.
>
> Please comment either the dose is too low or too high.
>
> Thanks,
>
> Yingtao
reply
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