Dear colleagues,

I'd like to thank you everyone who give me suggestions and ideas into
working out better uniformity in KOH etching.As a result I have achieved

a considerable etching uniformity which is within 5um.I observed that
agitation, half way wafer rotation and turning wafer back to front was
the most effective way of achieving better uniformity.

I have listed below the names who gave helpful hints and suggestions.

Luc Bousse
Enric Cabruja
Patrick Cheung
Johan Drott
Alan M. Gundlach
Padraig Hughes
James Marchetti
Pushkar Merwah
Kiyotaka Mori
Andrezej Prochaska

Best regards,
Regan Nayve
regan.nayve@ieee.org