Hi all,

We have a UV light source which is being used for exposing SU-8. It is not a
mask aligner with an advanced UV source but it still works for patterning SU-8
features that are more than 100um wide with an aspect ratio of 0.5. However, I
found that the side walls are not very vertical for narrow(smaller than 30um)
and tall (over 200um) features.

I believe the UV light is the culprit, which is not very directional so the side
walls are tapered, especially for those tall and narrow features.

Does anyone know if there is a way to improve the directionality of the light
source?


Best
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