Justin wrote:
In trying to get SU-8 to work as a photoresist on glass, I've had a hard time
getting the SU-8 to stay on the glass once I start developing it in the SU-8
developer.
Does anyone know if I an adhesion layer on the glass under the SU-8?  or is
there still another solution?

If you are using the SU8 as an etch mask for Hf wet etching hen you
may need an underlying metallic film that will hold up in Hf.  HMDS is
often used as an adhesion promoter for thin SiO2 films.  Have you
tried to condition the glass prior to coating?

Also, is SU-8 supposed to bond with (and stick to) a silicon wafer
when processing it as a photoresist, even after placing it in the SU-8
developer?

Dehydration bake followed by HMDS is common for photoresist adhesion..
For additional information contact Scott Heidemann at Micro Chem Corp.
617-965-5511  Any suggestions will help.  Thanks in
advance.

Justin Holzer