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MEMSnet Home: MEMS-Talk: AZ 40 XT processing
AZ 40 XT processing
2015-01-08
Orozaliev Ajymurat Nurdinovich
2015-01-09
Ioannis Nikolaou
AZ 40 XT processing
Orozaliev Ajymurat Nurdinovich
2015-01-08
Hi All,

Anyone knows a good recipe for AZ 40XT positive resist?
My target thickness is 50 um.

I am doing following process but always getting bubbles during post
exposure bake and sometimes bubbles appear during soft baking step.

Sometimes foam would form on the middle of the subsrate.

1.HMDS priming in an YES oven.

2.Spin coating
 -1000 rpm - 20 sec,100 rpm/s ramp
 -2500 rpm - 2 sec,1000 rpm/s ramp (to remove the edge bead)

3.  Soft baking on a contact hotplate
 - 40 - 100 C, gradually increasing
 - 115 C,for 3 mins (second hotplate)

4. Exposure (No rehydration performed, since the datasheet says so)
  - Exposure for 60 seconds on a SUSS MA8 contact aligner tool,lamp
intensity 10mW/cm2.

5. Post exposure bake on a hotplate
   -60-90 C, gradually increase the T.\
   - 105 C for 100 sec.

6. Develop
    AZ726 MIF for 8-10 um.

Any expert can comment on this?

thanks in advance,
Ajy
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