Hello,
I'm trying to use the shipley electrodepositable photoresist PEPR 2400.
During first tests, I obtain a layer on my wafer, but when I want to dry it,
the photoresist seems to lose adherence and after 5 minutes there is only
dust of resist on it.
Did anybody try such a resist, and had the same problem?
Thanks for suggestions or ideas.


SILLON Nicolas
CEA / Leti
DMITEC / SIA / ES
Tel:   04 76 88 36 01
Fax:  04 76 88 94 56
[email protected]