Re: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
Steve Rosenberg
1999-02-19
You can use FIB (Focused Ion Beam) Systems to mill and make parts for MEMS.
FIB is like an NC tool on a nanometer scale. If you need services (i.e.
don't want to buy the machine yourself) in doing MEMS work using this tool
you can contact Norsam at 503-640-3367.
We at Deschutes Corporation make components for the FIB and SEM industry and
are in the process of investigating FIB systems dedicated to MEMS work
(prototyping or production). If anyone have any feedback on this subject
please let me know.
The FIB systems of today are targeted to the semiconductor industry (Failure
Analysis and Edit of IC's).
Best regards,
Steve Rosenberg
Deschutes Corporation
17400 SW Upper Boones Ferry Rd #240
Durham OR 97224
(503) 443-3602 Fax: (503) 443-2353
Email: [email protected]
-----Original Message-----
From: [email protected]
To: [email protected]
Date: Friday, February 19, 1999 11:42 AM
Subject: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
> Hello everyone,
>
> I'm currently working on process development for a multilayer
> microwave integrated circuit. My final metallization layer is
> aluminum, and I would like to minimize undercutting, so I am
> considering a Barium Chloride type of dry etching procedure,
>
> However, I recently learned about the ion-milling technique. It claims
> to have virtually no undercut, and high yields. A careful choice of
> photoresist must be made as the process generates much heat.
>
> Anyone have any experience with ion milling? I would appreciate a list
> of references, and some advice as to if this process is suitable for
> microwave integrated circuits. I've already consulted the Jan '85
> paper from Microwaves and RF.
>
> Thanks in advance,
>
> Avinash Kane
> Raytheon Systems Company
> Solid State Microwave
> Fullerton, California
> [email protected]
>
>
>