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MEMSnet Home: MEMS-Talk: RE: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
RE: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
1999-02-19
Sanjay Dhar
1999-02-19
Sanjay Dhar
RE: Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
Sanjay Dhar
1999-02-19
Ion Milling is used as a standard production process in the magnetic thin
film head industry.
Don't have any references or such...but ion mill vendors would be more than
happy to give you info.

sanjay

> ----------
> From:         [email protected][SMTP:[email protected]]
> Reply To:     [email protected];[email protected]
> Sent:         Friday, February 19, 1999 9:39 AM
> To:   [email protected]
> Subject:      Ion Milling as an Alternative to Wet/Dry Etching of Aluminum
>
>      Hello everyone,
>
>      I'm currently working on process development for a multilayer
>      microwave integrated circuit. My final metallization layer is
>      aluminum, and I would like to minimize undercutting, so I am
>      considering a Barium Chloride type of dry etching procedure,
>
>      However, I recently learned about the ion-milling technique. It
> claims
>      to have virtually no undercut, and high yields. A careful choice of
>      photoresist must be made as the process generates much heat.
>
>      Anyone have any experience with ion milling? I would appreciate a
> list
>      of references, and some advice as to if this process is suitable for
>      microwave integrated circuits. I've already consulted the Jan '85
>      paper from Microwaves and RF.
>
>      Thanks in advance,
>
>      Avinash Kane
>      Raytheon Systems Company
>      Solid State Microwave
>      Fullerton, California
>      [email protected]
>
>
>


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