Hi James

First, I´m so sorry (my English is poor)

I´m working on silicon supports for condenser microphone applications. In
that design, the silicon supports (or silicon pyramid) have been used for
to build a backchamber. The heigth of the supports is of the order 25 um.
In our design KOH was used (44% by weight at 55 Celcius degrees). All
information are included in a paper, which has been acceptd for publication.

If You can send me a postal address I´ll send You a copy by FedEx.

See You

F. Sandoval

On Tue, 16 Feb 1999, james cotsell wrote:

> Dear researchers,
>
> I am currently trying to form pyramids on silicon wafers for use in the
> manufacture of solar cells (texturing).  My process at the moment
> involves a dip in concentrated KOH followed by immersion in a 10% KOH
> solution containing isopropanol. While this works ocasionally It often
> doesn't and I was wondering if anyone can help me with making the
> methind more reliable.
>
> Any information on the anisotropic etching of silicon would also be
> appreciated, particularly on the chemistry of the whole procedure.
>
> Thanks in advance,
>
> James Cotsell
>
>