Moderator's note:
Sridhar Gullapalli is working with Mr. Than to make this simulation tool
available via the MEMS Archive. A follow-up message will be posted when the
tool is ready for distribution.

- bill athas

Dear Colleagues,

I have developed a software tool for simulating anisotropic and isotropic wet
etching. It is based on a three-dimensional model using cellular automata. The
program simulates the etch process on the atomic level.

The tool has several noteworthy features:

  * different etch rates are possible for different etchants, e.g., KOH, KOH/
    IPA, and TMAH.
  * basic substrates: (100) and (110) Si
  * double-sided etching. A mask on the top and another one on the bottom side
    are simulated simultaneously.
  * the simulation may be paused so that you can change the mask process
    parameters, and then resumed.
  * the areas for selective etch-stop are definable.
  * the results can be exported in DXF.
  * photo-realistic images of the results can be created.

I am looking for opportunites to integrate my simulation tool (running on PC,
Mac, and Unix workstations (HP 70xx) ) with MEMS-CAD systems and I am looking
for places to distribute the simulator.

If this sounds interesting to you, please send me e-mail for more information.

_____________________________________________________________________

           Institut fuer Mikrotechnik der TU-Braunschweig

              W-3300 Braunschweig      Langer Kamp 8

            Tel: +49 531 3913320   FAX: +49 531 3918101


              Olaf Than       Tel: +49 531 3913334
              Internet: o.than@tu-bs.de