Question to discussion group:

I search for a HF (hydroflouric acid) and HF/HNO_3 resistant
metalization system
with good adhesion properties to chemical inert surfaces like Al_2_O_3,
diamond.....
(Au does not adhere)
Usually I use a Au/Ti or a Au/Si based metalization but they are
both not resistant to the above mentioned acids. Also annealing did not
lead to higher resistivities
against HF and HF/HNO_3.

I would be very grateful for any suggestion and help

thank everybody in advance

Mario