Behraad:

You don't have to re-invent XeF2 etching system. Our parent company FEI
already has a system where we are routinely etching oxides using XeF2 inside
a focused ion beam system. Check FEI's website www.feico.com for more
details. If you need more information either you can contact FEI or you can
call me at 503 640 0586. Thanks

Jayant
************************************************************
Jayant Neogi
CEO/President
3Beams Technologies
Norsam Technologies
Ph  503-640-0586/503-356-9197
Fax 503-640-8117
************************************************************


-----Original Message-----
From: Behraad Bahreyni [mailto:[email protected]]
Sent: Tuesday, March 21, 2000 4:02 PM
To: [email protected]
Subject: XeF2



Dear colleagues:

  I want to set up a XeF2 etching system (in its gaseous form not as a
plasma) for etching Silicon,
 but I wonder whether it reacts with the oil (used in vacuum pump) or not
(I'm worried about the
 formation of HF which can affect the future use of the chamber and pump)
  I also want to know what kind of valves I should use as the vacuums valve
and what is the best
 material for the chamber itself.
  Can anybody help me with these questions?

  Thanks in advance,
  Behraad Bahreyni