Hello to all,

I am looking for different approches to align precisely a photolithography mask
to the crystallographic planes of silicon.
The reason is simple, I will do an anisotropic wet etch with the transfered
patterns and require them to be well aligned to the crystal structure for the
etch to proceed properly.

I work with standard 150mm {100} silicon wafers, but comments from other fields
are welcome.

Regards,

Robert Antaki
Implantation engineer,
Mitel S.C.C.
Bromont, Qc, Canada