To group
I was wondering if there were any commercial services which could
anisotropically etch thick SiO2. The thickness of SiO2 varies from 30  to 60
microns and is deposited on an Silicon substrate. The need is for prototype
services on say ten, 4 and 6 inch wafers. If successful there would be a
need to scale up the process to production levels.
--
Keith Jackson
Lawrence Berkeley National Laboratory
Berkeley, Ca 94720
510-486-6894 voice
510-486-4955 fax