Hi everybody,
I am considering to use O3 (Ozone) - TEOS  as passivation and dielectric
layer. I am aware of cluster systems to deposit O3/TEOS oxide. However,
since I am interested in double-sided deposition I would prefere a
furnace-like system. Does anybody know of (not too expensive, R&D) such
deposition systems? Any information will be highly appreciated.
Best regards,
Matthias

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Matthias Heschel, PhD
Assistant Research Professor, MEMS
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Microelectronics Center
Technical University of Denmark, Bldg. 345 east
DK-2800 Lyngby