Hi folks,
          I am trying to etch out Sio from a patterened Si wafer. I am
using a neagtive process using SC 1827 resist and a CF4 plasma etc. My
problem is that, the resist starts to etch away after about 20 mins.

I would like to know if anybody has ever tried to etch out Sio. If u have
please give me some details.

Thanks,

Saravana,

Graduate Research Assistant,
Dept of EE,
USF.