Dear Sir,

I am very glad to know In-situ Phos and Boron doped polysislicon film
can be deposited by your lab. Would you mind helping us to deposit some
in-siyu doped film? Our requirement is :

1) In-situ Phos(or As) doped polysilicon , thickness= 300nm, doping
conc= 1e20cm-3
2) In-situ Boron doped ploysislicon, thickness = 500nm---1um, doping
conc= 1e17cm-3

Can you reply to us as soon if you can do it, and also wish you can tell
me how much money per wafer.
Our wafer is 4 inches. Thank you very much.

Best wishes,
LIu Haitao

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Haitao Liu
Tel: 852-23587074, 23587052
Fax: 852-23581485
Dept. of EEE
HK Univ. of Sci & Tech.