Hi,

We have some sapphire wafers which we need to modify by producing  'holes'
somewhere around 50 microns diameter, 200 microns deep. We need a fairly
urgent solution to this, but we have a constraint that because of other
devices on the wafer we would want to keep the temperature as low as
possible.

We tried FIB, but the milling rate is too slow to be practical. Does anyone
have any idea
a)      if there is a better method for etching sapphire?
b)      Is there a lab in Europe who could help us?

Regards

Tim


*****************************************************************
Tim E. Harper                    Managing Director
CMP Cientifica s.l.
Space & NanoTechnology Division
Phone +34 91 640 71 85       Fax  +34 91 640 71 86
http://www.cmp-cientifica.com/