Hello, all?

I am making some microchannel. For channel etching,
someone recommended to use TMAH etchant as an
isotropic etchant for Silicon instead of DRIE dry
etching which is my preferred method. But, as far as I
know, TMAH is an anisotropic etchant of Silicon
similar to KOH. What I know as the isotropic etchant
of Silicon is HNA(HNO3+H2O+NH4F). Can the TMAH be
isotropic? And can photoresist be a mask for TMAH and
HNA wet etching?

Thank you and have a happy new year.

Chang.


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Chang-Hwan Choi
Brown University
Division of Engineering, Box D
Providence, RI 02912, U.S.A.

Tel: (401)867-6017(H), (401)863-2656(O), Fax: (401)863-9028
Email: chchoi@rocketmail.com, Chang-Hwan_Choi@Brown.edu

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