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MEMSnet Home: MEMS-Talk: Gallium Arsenide surface cleaning and appropriate adhesion
Gallium Arsenide surface cleaning and appropriate adhesion
2001-04-19
Jordan Neysmith
Gallium Arsenide surface cleaning and appropriate adhesion
Jordan Neysmith
2001-04-19
              metals.
To the discussion group,

Does anyone have suggestions for cleaning of GaAs wafers with similar
effectiveness to the piranha or RCA procedures used on silicon (primarily
for organic removal)?

In addition, what metals are most appropriate for adhesion layers when
depositing contact pads on GaAs.  While Ti and Cr are common in the silicon
world due to their affinity to oxidized surfaces, the lack of a good native
oxide on GaAs surfaces seems to suggest they would be less effective on
GaAs.  Are any special surface preparation steps required to ensure good
adhesion?

Any input would be appreciated.

Sincerely,

Jordan Neysmith
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