Hi,

We are presently working on a diode lot which requires Mo deposition on an
oxide layer. However the Mo layer deposited is flaking on exposure to a
standard clean process (involving acetone, ISP and DI). Can anyone suggest
methods to improve Mo adhesion to oxide. The oxide layer is approx 0.52um
and we require a Mo layer of atleast 2000 A. The oxide was grown at 1100 C
for 5 hrs.

Thanks a lot
Ritwik

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                                Mr. Ritwik Mishra
                Department of Electrical & Computer Engineering
 Research Assistant
 Mississippi Center for Advanced Semiconductor Prototyping (MCASP)
 P. O. Box 4668
 Mississippi State, MS 39762-4668
 PHONE (662): MCASP 325-9476, 2059 FAX: 325-2298
              HOME  320-9393
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