Dear Colleagues,

I am wondering how to etch deeply (150 um) in prexy glass without losing
masking resist layer. Au has been used as a masking layer for shallow
etching. But, is there any kind of adhesive promoters that  would allow the
photoresist to stand longer (1 hr) in the HF solution? I am also interested
in the companies that could provide DRIE service for glass. Any info is
highly appreciated.

Thanks,

harry
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