Dear sir:
    We are surveying the micromaching process and foundry for 45 degrees
optical grade mirror etching process.  The rms surface roughness should be
within 30nm, and peak to peak roughness should be within 100nm forthe 45
degree mirror. The mirror will be etching on the silicon substrate and the
depth will be 80um. I would like to know whom could provide me this kind of
etching service?

yours faithfully
hsiao-wen lee