Hi,
I'm Alvise Bagolini from the IRST research institute (Italy). We are working
with thick photoresist (MA-P100, the thickness is about 20um), but we have
problems wth sidewalls (the shape is a bended line, and we need it more linear
and vertical). Can anybody soggest a solution?
Thanks,
Alvise

Alvise Bagolini
ITC-IRST
via Sommarive 18
38050 Povo, Trento
Italy
Tel: 0461 314539